Annealing effects on photoresist films' mechanical and chemical resistance

Fil: Avellaneda, Manuel. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina

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Bibliographic Details
Main Authors: Avellaneda, Manuel, Boasso, Andrés, Sirena, Martin, Roa Díaz, Simón Andre
Published: Elsevier 2023
Online Access:https://nuclea.cnea.gob.ar/handle/20.500.12553/8167
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