Annealing effects on photoresist films' mechanical and chemical resistance
Fil: Avellaneda, Manuel. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina
Saved in:
| Main Authors: | , , , |
|---|---|
| Published: |
Elsevier
2023
|
| Online Access: | https://nuclea.cnea.gob.ar/handle/20.500.12553/8167 |
| Tags: |
No Tags, Be the first to tag this record!
|