Avellaneda, M., Boasso, A., Sirena, M., & Roa Díaz, S. A. (2023). Annealing effects on photoresist films' mechanical and chemical resistance. Elsevier.
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Chicago Style (17th ed.) Citation
Avellaneda, Manuel, Andrés Boasso, Martin Sirena, and Simón Andre Roa Díaz. Annealing Effects on Photoresist Films' Mechanical and Chemical Resistance. Elsevier, 2023.
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MLA (9th ed.) Citation
Avellaneda, Manuel, et al. Annealing Effects on Photoresist Films' Mechanical and Chemical Resistance. Elsevier, 2023.
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Warning: These citations may not always be 100% accurate.