The recrystallization of ion-implanted silicon layers. II: Implant species effect.

Fil: Christodoulides, C. E. Comisión Nacional de Energía Atómica; Argentina

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Bibliographic Details
Main Authors:	Christodoulides, C. E., Baragiola, R. A., Chivers, D., Grant, W. A., Williams, J. S.
Language:	English
Published:	Gordon and Breach Science 1978
Subjects:	RECRYSTALLIZATION ION IMPLANTATION SILICON IMPLANTS RUTHERFORD BACKSCATTERING SPECTROSCOPY POLYCRYSTALS
Online Access:	https://nuclea.cnea.gob.ar/handle/20.500.12553/1953
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