The recrystallization of ion-implanted silicon layers. II: Implant species effect.

Fil: Christodoulides, C. E. Comisión Nacional de Energía Atómica; Argentina

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Bibliographic Details
Main Authors: Christodoulides, C. E., Baragiola, R. A., Chivers, D., Grant, W. A., Williams, J. S.
Language:English
Published: Gordon and Breach Science 1978
Subjects:
Online Access:https://nuclea.cnea.gob.ar/handle/20.500.12553/1953
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author Christodoulides, C. E.
Baragiola, R. A.
Chivers, D.
Grant, W. A.
Williams, J. S.
author_browse Baragiola, R. A.
Chivers, D.
Christodoulides, C. E.
Grant, W. A.
Williams, J. S.
author_facet Christodoulides, C. E.
Baragiola, R. A.
Chivers, D.
Grant, W. A.
Williams, J. S.
author_sort Christodoulides, C. E.
collection DSpace
description Fil: Christodoulides, C. E. Comisión Nacional de Energía Atómica; Argentina
id dspace-20.500.12553-1953
institution Repositorio Institucional NUCLEA
language eng
publishDate 1978
publishDateSort 1978
publisher Gordon and Breach Science
publisherStr Gordon and Breach Science
record_format dspace
spelling dspace-20.500.12553-19532025-07-16T23:32:05Z The recrystallization of ion-implanted silicon layers. II: Implant species effect. Christodoulides, C. E. Baragiola, R. A. Chivers, D. Grant, W. A. Williams, J. S. RECRYSTALLIZATION ION IMPLANTATION SILICON IMPLANTS RUTHERFORD BACKSCATTERING SPECTROSCOPY POLYCRYSTALS Fil: Christodoulides, C. E. Comisión Nacional de Energía Atómica; Argentina Baragiola, R. A. Comisión Nacional de Energía Atómica; Argentina Chivers, D. Comisión Nacional de Energía Atómica; Argentina Grant, W. A. Comisión Nacional de Energía Atómica; Argentina Williams, J. S. Comisión Nacional de Energía Atómica; Argentina Comisión Nacional de Energía Atómica; Argentina Gordon and Breach Science 1978 info:eu-repo/semantics/openAccess application/pdf https://nuclea.cnea.gob.ar/handle/20.500.12553/1953 eng Radiation effects V 36 1978
spellingShingle RECRYSTALLIZATION
ION IMPLANTATION
SILICON IMPLANTS
RUTHERFORD BACKSCATTERING SPECTROSCOPY
POLYCRYSTALS
Christodoulides, C. E.
Baragiola, R. A.
Chivers, D.
Grant, W. A.
Williams, J. S.
The recrystallization of ion-implanted silicon layers. II: Implant species effect.
title The recrystallization of ion-implanted silicon layers. II: Implant species effect.
title_full The recrystallization of ion-implanted silicon layers. II: Implant species effect.
title_fullStr The recrystallization of ion-implanted silicon layers. II: Implant species effect.
title_full_unstemmed The recrystallization of ion-implanted silicon layers. II: Implant species effect.
title_short The recrystallization of ion-implanted silicon layers. II: Implant species effect.
title_sort recrystallization of ion implanted silicon layers ii implant species effect
topic RECRYSTALLIZATION
ION IMPLANTATION
SILICON IMPLANTS
RUTHERFORD BACKSCATTERING SPECTROSCOPY
POLYCRYSTALS
url https://nuclea.cnea.gob.ar/handle/20.500.12553/1953
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