Chemical surface preparation, passivation and cleaning for semiconductor growth and processing.
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| Main Author: | |
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| Format: | Conference Proceeding Book |
| Published: |
Pittsburgh :
Materials research society,
1992.
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| Series: | /Materials research society symposium proceedings -- v.259/
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| LEADER | 00000nam a2200000 a 4500 | ||
|---|---|---|---|
| 008 | 170703s1992#### ||||f#|||||10| 0#uuu#d | ||
| 003 | AR-SmCIES | ||
| 091 | |a 1927 PMTM | ||
| 100 | 1 | |a Nemanich, R. J. et al |e eds. | |
| 245 | 1 | 0 | |a Chemical surface preparation, passivation and cleaning for semiconductor growth and processing. |
| 260 | |a Pittsburgh : |b Materials research society, |c 1992. | ||
| 300 | |a 529 p. | ||
| 490 | 1 | |a /Materials research society symposium proceedings -- v.259/ | |
| 650 | 7 | |a SEMICONDUCTORS |2 INIS | |
| 650 | 7 | |a CRYSTAL GROWTH |2 INIS | |
| 711 | 2 | |a Symposium on chemical surface preparation, passivation and cleaning for semiconductor growth and processing |c San Francisco,US |d 1992 | |
| 830 | |a /Materials research society symposium proceedings -- v.259/ | ||
| 999 | |c 21346 |d 21346 | ||
| 952 | |0 0 |1 0 |2 udc |4 0 |7 0 |a CIES-CAC |b CIES-CAC |d 2018-02-20 |i 1927 PMTM |o 621.382 N2 |p 1927 PMTM |r 2018-02-20 00:00:00 |w 2018-02-20 |y BK | ||