Chemical surface preparation, passivation and cleaning for semiconductor growth and processing.
Saved in:
| Main Author: | |
|---|---|
| Corporate Author: | |
| Format: | Conference Proceeding Book |
| Published: |
Pittsburgh :
Materials research society,
1992.
|
| Series: | /Materials research society symposium proceedings -- v.259/
|
| Subjects: | |
| Tags: |
No Tags, Be the first to tag this record!
|
Similar Items: Chemical surface preparation, passivation and cleaning for semiconductor growth and processing.
- Atomic scale structure of interfaces.
- Preparation and crystal growth of materials with layered structures.
- Surface properties of semiconductors.
- Electron microscopy of thermally etched surfaces of NaCl.
- Single crystals of LnFeAsO1-xFx (Ln=La, Pr, Nd, Sm, Gd) and Ba1-xRbxFe2As2: growth, structure and superconducting properties
- Structure of sodium chloride cleavage surfaces etched in vacuum at moderate temperature.