Plasma properties, deposition and etching.

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Bibliographic Details
Main Author:	Pouch, J. J. (ed.)
Other Authors:	Alterovitz, S. A. (ed.)
Format:	Book
Language:	English
Published:	Aedermannsdorf : Trans Tech Publications, 1993.
Subjects:	PLASMA, FISICA DEL
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LEADER	00000nam a2200000 a 4500
008	170703s1993####sz a\|\|\|f#\|\|\|\|\|00\| 0#eng#d
003	AR-SmCIES
020			\|a 087849670X
022			\|a 02555476
041		7	\|a en \|2 ISO 639-1
041		7	\|a en \|2 ISO 639-1
091			\|a 47536
100	1		\|a Pouch, J. J. \|e ed.
245	1	0	\|a Plasma properties, deposition and etching.
260			\|a Aedermannsdorf : \|b Trans Tech Publications, \|c 1993.
300			\|a x, 742 p. : \|b il.
500			\|a Bibliografía al final de cada trabajo
500			\|a Publicación de la revista "Materials science forum" vol.140/142 de 1993
650		4	\|a PLASMA, FISICA DEL
700	1		\|a Alterovitz, S. A. \|e ed.
999			\|c 19012 \|d 19012
952			\|0 0 \|1 0 \|2 udc \|4 0 \|7 0 \|a CIES-CAC \|b CIES-CAC \|d 2018-02-20 \|i 47536 \|o 533.9 P86 \|p 47536 \|r 2018-02-20 00:00:00 \|w 2018-02-20 \|y BK