Vacuum deposition of thin films.
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| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
London :
Chapman and Hall,
1963.
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| Subjects: | |
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MARC
| LEADER | 00000nam a2200000 a 4500 | ||
|---|---|---|---|
| 008 | 170703s1963####enk||||f#|||||00| 0#eng#d | ||
| 003 | AR-SmCIES | ||
| 041 | 7 | |a en |2 ISO 639-1 | |
| 091 | |a 20150 | ||
| 100 | 1 | |a Holland, Leslie | |
| 245 | 1 | 0 | |a Vacuum deposition of thin films. |
| 260 | |a London : |b Chapman and Hall, |c 1963. | ||
| 300 | |a 555 p. | ||
| 500 | |a With a foreword by professor S. Tolansky | ||
| 500 | |a Laminas 25 al final de la obra | ||
| 500 | |a Apendice y bibliografia: p. 510-546 | ||
| 650 | 4 | |a VACIO, TECNICAS DEL | |
| 999 | |c 19866 |d 19866 | ||
| 952 | |0 0 |1 0 |2 udc |4 0 |7 0 |a CIES-CAC |b CIES-CAC |d 2018-02-20 |i 20150 |o 533.5 H719v 1963 |p 20150 |r 2018-02-20 00:00:00 |w 2018-02-20 |y BK | ||