Quinteros, C. P., Hardtdegen, A., Barella, M., Golmar, F., Palumbo, F. R. M., Curiale, C. J., . . . Levy, P. E. (2018). The Atomic Layer Deposition Technique for the Fabrication of Memristive Devices: Impact of the Precursor on Pre-deposited Stack Materials. IntechOpen.
Successfully copied to clipboard
Copying to clipboard failed
Chicago Style (17th ed.) Citation
Quinteros, Cynthia Paula, Alex Hardtdegen, Mariano Barella, Federico Golmar, Félix Roberto Mario Palumbo, Carlos Javier Curiale, Susanne Hoffmann Eifert, and Pablo Eduardo Levy. The Atomic Layer Deposition Technique for the Fabrication of Memristive Devices: Impact of the Precursor on Pre-deposited Stack Materials. IntechOpen, 2018.
Successfully copied to clipboard
Copying to clipboard failed
MLA (9th ed.) Citation
Quinteros, Cynthia Paula, et al. The Atomic Layer Deposition Technique for the Fabrication of Memristive Devices: Impact of the Precursor on Pre-deposited Stack Materials. IntechOpen, 2018.
Successfully copied to clipboard
Copying to clipboard failed
Warning: These citations may not always be 100% accurate.